Exposure Machine LTS2233
Product Characteristics:
• As a maskless lithography technology, direct imaging lithography enables high-precision patterning of any design simply by controlling the light intensity and scanning the imaging path. This method is simpler and more cost-effective compared to other imaging techniques, thereby facilitating high-precision, highly flexible, and low-cost production.
• With the advancement of direct imaging lithography technology, its production efficiency has significantly improved. Currently, direct imaging equipment and direct imaging lithography equipment are increasingly being applied in areas such as PCB manufacturing, wafer level packaging, and FPD display panel manufacturing.
• By integrating advanced technologies such as DLP technology, ultraviolet laser technology, FPGA technology, and high precision motion platform technology, laser direct imaging exposure machine without film and photomask has been developed.









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